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Overcoming the Diffraction Limit Using Multiple Light Scattering in a Highly Disordered Medium
Departmental Papers (BE)
  • Youngwoon Choi, Korea University - Korea
  • Taeseok Daniel Yang, Korea University - Korea
  • Christopher Fang-Yen, University of Pennsylvania
  • Pilsung Kang, Korea University
  • Kyoung Jin Lee, Korea University
  • Ramachandra R. Dasari, Massachusetts Institute of Technology
  • Michael S. Feld, Massachusetts Institute of Technology
  • Wonshik Choi, Korea University
Document Type
Journal Article
Date of this Version
7-6-2011
Abstract

We report that disordered media made of randomly distributed nanoparticles can be used to overcome the diffraction limit of a conventional imaging system. By developing a method to extract the original image information from the multiple scattering induced by the turbid media, we dramatically increase a numerical aperture of the imaging system. As a result, the resolution is enhanced by more than 5 times over the diffraction limit, and the field of view is extended over the physical area of the camera. Our technique lays the foundation to use a turbid medium as a far-field superlens.

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Suggested Citation:
Choi, Y. et al. Overcoming the Diffraction Limit Using Multiple Light Scattering in a Highly Disordered Medium. Physical Review Letters 107, 023902.

© 2011 American Physical Society
http://dx.doi.org/10.1003/PhysRevLett.107.023902

Citation Information
Youngwoon Choi, Taeseok Daniel Yang, Christopher Fang-Yen, Pilsung Kang, et al.. "Overcoming the Diffraction Limit Using Multiple Light Scattering in a Highly Disordered Medium" (2011)
Available at: http://works.bepress.com/cfangyen/4/