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Article
Interface Characteristics of Vertically Aligned Carbon Nanofibers for Interconnect Applications
Electrical and Computer Engineering
  • Yusuke Ominami
  • Quoc Ngo
  • Makoto Suzuki
  • Alexander J. Austin
  • Cary Y. Yang, Santa Clara University
  • Alan M. Cassell
  • Jun Li
Document Type
Article
Publication Date
12-25-2006
Publisher
American Institute of Physics Publishing
Abstract

The authors characterize the detailed interface structure of Ni-catalyzed vertically aligned carbon nanofibers (CNFs) prepared by plasma-enhanced chemical vapor deposition for interconnect applications. Stacked graphitic layers and cup-shape structures of CNFs around the interface region have been observed using high-resolution scanning transmission electron microscopy. The interaction between the Ni catalyst and Ti layer dramatically affects the CNF structure during initial growth. The effect of interface nanostructures on contact resistance is also discussed.

Comments

Copyright © 2006 American Institute of Physics Publishing. Reprinted with permission.

Citation Information
Y. Ominami, Q. Ngo, M. Suzuki, A.J. Austin, C.Y. Yang, A.M. Cassell, and J. Li, “Interface Characteristics of vertically Aligned Carbon Nanofibers for Interconnect Applications,” Applied Physics Letters 89, 263114 (3 pp) (2006). https://doi.org/10.1063/1.2423241