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Iron doped amorphous hydrogenated carbon nitride
Solid State Communications (1989)
  • He-Xiang Han, University of Missouri–St. Louis
  • Bernard J. Feldman, University of Missouri–St. Louis
  • G. Fraundorf, Monsanto
  • P. Fraundorf, Monsanto
Amorphous carbon nitride iron-containing thin films have been grown from the plasma decomposition of a feedstock of CH4, N2, and H2. From Auger Electron Spectroscopy, these films contain C, N, O, Fe and a small amount of Cr and Ni. The presence of Fe, Cr and Ni is due to sputtering of the stainless steel cathode. From Hall and thermopower measurements, these films are p-type degenerate semiconductors. From transmission electron microscopy, these films contain microcrystallites of FeO embedded in an amorphous matrix.
Publication Date
September 1, 1989
Citation Information
He-Xiang Han, Bernard J. Feldman, G. Fraundorf and P. Fraundorf. "Iron doped amorphous hydrogenated carbon nitride" Solid State Communications Vol. 71 Iss. 10 (1989) p. 801 - 803
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