UV-irradiation and thermal-annealing studies in amorphous hydrogenated boron nitride thin filmsPhysical Review B (1997)
Both photoproduction and photobleaching of dangling bonds by uv irradiation and thermal annealing were observed by electron spin resonance (ESR) in amorphous hydrogenated boron nitride. A model involving long-range hydrogen diffusion and hydrogen evolution is proposed to account for the ESR spectral line shapes observed after uv irradiation and thermal annealing. A Gaussian distribution of activation energies for the long-range hydrogen diffusion was used to explain the observed decrease in spin susceptibility after thermal annealing. A best fit to the spin susceptibility data gave an average activation energy of 0.0475 eV and a half-width of this Gaussian distribution of 0.027 eV.
Publication DateJuly 15, 1997
Citation InformationIan M. Brown, Shu-Han Lin and Bernard J. Feldman. "UV-irradiation and thermal-annealing studies in amorphous hydrogenated boron nitride thin films" Physical Review B Vol. 56 Iss. 3 (1997) p. 994 - 996
Available at: http://works.bepress.com/bernard-feldman/26/