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Contact engineering for nanocarbon interconnects
Electrical and Computer Engineering
  • Yusuke Abe
  • Anshul A. Vyas, Santa Clara University
  • Richard Senegor
  • Patrick Wilhite
  • Cary Y. Yang, Santa Clara University
Document Type
Conference Proceeding
Publication Date
2-21-2016
Publisher
IEEE
Abstract

Electron-beam-induced deposited-tungsten (EBID-W) technique is used to fabricate contacts for carbon nanofiber (CNF) horizontal interconnect and carbon nanotube (CNT) vertical vias to improve the contact resistances at the nanocarbon-metal electrodes.

Comments
IEEE 15th International Conference on Nanotechnology (IEEE-NANO)
27-30 July 2015
Rome, Italy
Citation Information
Abe, Y., Vyas, A., Senegor, R., Wilhite, P., & Yang, C. Y. (2015). Contact engineering for nanocarbon interconnects. 2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO), 1194–1196. https://doi.org/10.1109/NANO.2015.7388840