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Article
Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns
Journal of Micro-nanolithography Mems and Moems (2017)
  • Benjamin D. Nation, Georgia Institute of Technology
  • Andrew J. Peters, Georgia Institute of Technology
  • Richard A. Lawson, Georgia Institute of Technology
  • Peter J. Ludovice, Georgia Institute of Technology
  • Clifford L. Henderson, University of South Florida
  • Clifford L. Henderson, Georgia Institute of Technology
Disciplines
Publication Date
October 27, 2017
DOI
10.1117/1.JMM.16.4.043502
Citation Information
Benjamin D. Nation, Andrew J. Peters, Richard A. Lawson, Peter J. Ludovice, et al.. "Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns" Journal of Micro-nanolithography Mems and Moems Vol. 16 Iss. 4 (2017) p. 43502
Available at: http://works.bepress.com/andrew-peters/3/