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Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers
Proceedings of SPIE (2014)
  • Benjamin D. Nation, Georgia Institute of Technology
  • Andrew Peters, Georgia Institute of Technology
  • Richard A. Lawson, Georgia Institute of Technology
  • Peter J. Ludovice, Georgia Institute of Technology
  • Clifford L. Henderson, Georgia Institute of Technology
Disciplines
Publication Date
March 28, 2014
DOI
10.1117/12.2046626
Citation Information
Benjamin D. Nation, Andrew Peters, Richard A. Lawson, Peter J. Ludovice, et al.. "Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers" Proceedings of SPIE Vol. 9049 (2014)
Available at: http://works.bepress.com/andrew-peters/11/