Article
Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers
Proceedings of SPIE
(2014)
Publication Date
March 28, 2014
DOI
10.1117/12.2046626
Citation Information
Benjamin D. Nation, Andrew Peters, Richard A. Lawson, Peter J. Ludovice, et al.. "Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers" Proceedings of SPIE Vol. 9049 (2014) Available at: http://works.bepress.com/andrew-peters/11/