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Article
Fabrication of Inverted Opal ZnO Photonic Crystals by Atomic Layer Deposition
Applied Physics Letters
  • Michael Scharrer
  • Xiaohua Wu
  • Alexey Yamilov, Missouri University of Science and Technology
  • Hui Cao
  • Robert P. H. Chang
Abstract
We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.
Department(s)
Physics
Sponsor(s)
National Science Foundation (U.S.)
Keywords and Phrases
  • Atomic Layer Deposition
Library of Congress Subject Headings
Photoluminescence
Photonic crystals
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2005 Institute of Physics - IOP Publishing, All rights reserved.
Publication Date
1-1-2005
Disciplines
Citation Information
Michael Scharrer, Xiaohua Wu, Alexey Yamilov, Hui Cao, et al.. "Fabrication of Inverted Opal ZnO Photonic Crystals by Atomic Layer Deposition" Applied Physics Letters (2005)
Available at: http://works.bepress.com/alexey-yamilov/14/