Fabrication of Inverted Opal ZnO Photonic Crystals by Atomic Layer DepositionApplied Physics Letters
AbstractWe have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.
Sponsor(s)National Science Foundation (U.S.)
Keywords and Phrases
- Atomic Layer Deposition,
- Photonic crystals
Document TypeArticle - Journal
Document VersionFinal Version
Rights© 2005 Institute of Physics - IOP Publishing, All rights reserved.
Citation InformationMichael Scharrer, Xiaohua Wu, Alexey Yamilov, Hui Cao, et al.. "Fabrication of Inverted Opal ZnO Photonic Crystals by Atomic Layer Deposition" Applied Physics Letters (2005)
Available at: http://works.bepress.com/alexey-yamilov/14/