The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography Official contribution of the National Institute of Standards and Technology; not subject to copyright in the United States. The error bars presented throughout this manuscript indicate the relative standard uncertainty of the measurement. Certain commercial materials and equipment are identified in this paper in order to specify adequately the experimental procedure. In no case does such identification imply recommendation by the National Institute of Standards and Technology nor does it imply that the material or equipment identified is necessarily the best available for this purpose.
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