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Article
Design, Calibration, and Application of Optimized (111) Silicon Stress Sensing Test Chips
Mechanical and Materials Engineering Faculty Publications
  • Ahsan Mian, Wright State University - Main Campus
  • Robert A. Cordes
  • B. M. Wilamowski
  • S. Lin
  • Jeffrey C. Suhling
  • Richard C. Jaeger
Document Type
Conference Proceeding
Publication Date
9-12-1996
Abstract

Test chips incorporating piezoresistive stress sensors are powerful tools for experimental stress analysis of electronic packages. Sensor rosettes on (111) silicon offer the unique ability to characterize the complete stress state on the surface of a die. In this work, the design and calibration of two second generation (111) stress sensor test chips are described. The first test chip contains perimeter pads suitable for wire bond packages, and the second test chip contains an area pad array suitable for flip-chip applications. The rosettes on the fabricated (111) silicon sensor die have been calibrated using four-point bending, hydrostatic, and wafer level calibration methods. The test chips are currently being utilized to characterize stress in a variety of plastic encapsulated and flip-chip packages

Comments

Presented at the TECHCON Conference, Arizona, Sept. 12, 1996.

Citation Information
Ahsan Mian, Robert A. Cordes, B. M. Wilamowski, S. Lin, et al.. "Design, Calibration, and Application of Optimized (111) Silicon Stress Sensing Test Chips" (1996)
Available at: http://works.bepress.com/ahsan-mian/97/