Effects of boron implantation in films of iron-nickel
Article comments
The following article appeared in Ryu, J., Castell, K., Nowak, W., & Vittoria, C. (1988). Effects of boron implantation in films of iron-nickel. Journal of Applied Physics, 63(8), 4312-4314.
Abstract
We have implanted boron ions into films of Fe-Ni alloy composition. A homogeneous distribution of boron was determined from the sputter Auger analysis with a concentration of 18% and 34% for low- and high-dose implantation, respectively. The resistivity of film was increased by a factor of 2 and 4 as a result of low- and high-dose implantation, respectively. The magnetic properties of these films are studied as a function of annealing temperature by using FMR measurements. Both the uniaxial anisotropy field and FMR linewidth are dramatically decreased as a result of annealing at elevated temperatures. The changes of effective magnetization of these films are strongly dependent on implanted boron concentration.
Suggested Citation
J. Ryu, K. Castell, W. Nowak, and C. Vittoria. "Effects of boron implantation in films of iron-nickel" Mechanical and Industrial Engineering Faculty Publications (1988).
Available at: http://works.bepress.com/wnowak/1