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Deactivation of submelt laser annealed arsenic ultrashallow junctions in silicon during subsequent thermal treatment

Stephen Kelty, Seton Hall University
D. Giubertoni
M. G. Pepponi
S. Gennaro
M. Bersani
M. Kah
K.J. Kirkby
R. Doherty
M.A. Foad
F. Meirer
C. Streli
J.C. Woicik
Mehmet A. Sahiner

Suggested Citation

Stephen Kelty, D. Giubertoni, M. G. Pepponi, S. Gennaro, M. Bersani, M. Kah, K.J. Kirkby, R. Doherty, M.A. Foad, F. Meirer, C. Streli, J.C. Woicik, and Mehmet A. Sahiner. "Deactivation of submelt laser annealed arsenic ultrashallow junctions in silicon during subsequent thermal treatment" Journal of Vacuum Science and Technology B 28.1 (2010).

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