Deactivation of submelt laser annealed arsenic ultrashallow junctions in silicon during subsequent thermal treatment
Suggested Citation
Stephen Kelty, D. Giubertoni, M. G. Pepponi, S. Gennaro, M. Bersani, M. Kah, K.J. Kirkby, R. Doherty, M.A. Foad, F. Meirer, C. Streli, J.C. Woicik, and Mehmet A. Sahiner. "Deactivation of submelt laser annealed arsenic ultrashallow junctions in silicon during subsequent thermal treatment" Journal of Vacuum Science and Technology B 28.1 (2010).
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