The authors present a method for obtaining graphitized carbon on GaAs(100) surfaces. Carbon-doped GaAs is grown by molecular beam epitaxy before controlled thermal etching within the growth chamber. An AlAs layer beneath the carbon-doped GaAs acts as a thermal etch stop. As the GaAs is etched away, the carbondopant atoms remain on the surface due to their low vapor pressure. The total number of carbon atoms available is precisely controllable by the doping density and thickness of the carbon-doped GaAs layer. Characteristic phonon modes in Raman spectra from the thermally etchedsurfaces show that the residual surfacecarbon atoms form sp2-bonded graphitic crystallites.