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Article
Growth-Temperature Optimization for Low Carrier-Density In0.75Ga0.25As-Based High Electron Mobility Transistors on InP
Journal of Applied Physics (2007)
  • Paul J. Simmonds, University of Cambridge
  • H. E. Beere, University of Cambridge
  • D. A. Ritchie, University of Cambridge
  • S. N. Holmes
Abstract

Two-dimensional electron gases (2DEGs) were formed in undoped In0.75Al0.25As / In0.75Ga0.25As / In0.75Al0.25As quantum wells. The optimal growth temperature for this structure is 410°C, with peak 2DEG electron mobility and density values of μ = 221000 cm2/V s and n = 1.36 × 1011 cm−2 at 1.5 K. This electron mobility is equal to the highest previously published for these undoped structures but with a factor of 2 reduction in n. This has been achieved through the use of a significantly thinner InAlAs graded buffer, which supports the theory that this is the source of the 2DEG electrons. For n > 1.6×1011 cm−2, μ is shown to be 10% higher for transport parallel to the [011] crystal axis. This is a direct result of anisotropic surface morphology.

Keywords
  • electron gas,
  • electron mobility,
  • quantum wells,
  • anisotropy,
  • electron scattering
Publication Date
October 15, 2007
Publisher Statement
This document was originally published by AIP Publishing in the Journal of Applied Physics. Copyright restrictions may apply. doi: 10.1063/1.2798873
Citation Information
Paul J. Simmonds, H. E. Beere, D. A. Ritchie and S. N. Holmes. "Growth-Temperature Optimization for Low Carrier-Density In0.75Ga0.25As-Based High Electron Mobility Transistors on InP" Journal of Applied Physics Vol. 102 Iss. 8 (2007)
Available at: http://works.bepress.com/paul_simmonds/11/