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Article
Room temperature operational single electron transistor fabricated by focused ion beam deposition
Journal of Applied Physics
  • P. Santosh Kumar Karre, Michigan Technological University
  • Paul Bergstrom, Michigan Technological University
Document Type
Article
Publication Date
7-1-2007
Abstract

We present the fabrication and room temperature operation of single electron transistors using 8nm8nmtungsten islands deposited by focused ion beamdeposition technique. The tunnel junctions are fabricated using oxidation of tungsten in peracetic acid. Clear Coulomb oscillations, showing charging and discharging of the nanoislands, are seen at room temperature. The device consists of an array of tunnel junctions; the tunnel resistance of individual tunnel junction of the device is calculated to be as high as 25.13GΩ25.13GΩ. The effective capacitance of the array of tunnel junctions was found to be 0.499aF0.499aF, giving a charging energy of 160.6meV160.6meV.

Publisher's Statement

© 2007 American Institute of Physics. Publisher's version of record: http://dx.doi.org/10.1063/1.2761837

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Publisher's PDF
Citation Information
P. Santosh Kumar Karre and Paul Bergstrom. "Room temperature operational single electron transistor fabricated by focused ion beam deposition" Journal of Applied Physics Vol. 102 Iss. 2 (2007)
Available at: http://works.bepress.com/paul-bergstrom/7/