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Article
Far-from-equilibrium film growth on alloy surfaces: Ni and Al on NiAl(110)
Physical Review B
  • Yong Han, Iowa State University
  • Dapeng Jing, Iowa State University
  • Baris Unal, Ames Laboratory
  • Patricia A. Thiel, The Ames Laboratory (U.S. Department of Energy) and Iowa State University
  • James W. Evans, Iowa State University
Document Type
Article
Publication Version
Published Version
Publication Date
1-1-2011
DOI
10.1103/PhysRevB.84.113414
Abstract

STM analysis reveals diverse nonequilibrium island structures formed by deposition of Ni and Al on NiAl(110) at around 300 K. Epitaxial growth in this complex alloy system is described by multisite lattice-gas modeling incorporating DFT energetics for adatoms both at adsorption sites and transition states. This approach accounts for multiple adsorption sites and diffusion paths, and accurately describes diffusion and detachment kinetics for a vast number of step-edge configurations. This is key for realistic description of island growth shapes, structure, and partial alloy ordering.

Comments

This article is from Physical Review B 84 (2011): 113414, doi: 10.1103/PhysRevB.84.113414. Posted with permission.

Copyright Owner
American Physical Society
Language
en
File Format
application/pdf
Citation Information
Yong Han, Dapeng Jing, Baris Unal, Patricia A. Thiel, et al.. "Far-from-equilibrium film growth on alloy surfaces: Ni and Al on NiAl(110)" Physical Review B Vol. 84 Iss. 11 (2011) p. 113414-1 - 113414-4
Available at: http://works.bepress.com/patricia_thiel/111/