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Article
Ab Initio Study of Some Methylene and Silylene Insertion Reactions
Journal of the American Chemical Society (1991)
  • David R. Gano
  • Mark S. Gordon
  • Jerry A. Boatz, University of Utah
Abstract

The theoretical barriers and reaction energetics have been determined, using ab initio calculations at the MP4/6-3IG(d) level, with 3-2IG* geometries, for the insertions of methylene and silylene into the X-Y bonds of ethane, methylsilane, disilane, and cyclopropane and into the X-H bonds of disilane and ethane. A correlation was observed between barrier heights and lengths of substrate bonds. The largest barriers were observed for methylene and silylene inserting into the C-C bonds of ethane. The barriers became successively lower for the C-Si and Si-Si bonds. Steric interactions thus appear to be a major factor in determining barrier heights. The observed barriers for silylene and methylene inserting into the strained c-c bonds of cyclopropane were approximately 40 kcalfmol less than those for the analogous unstrained compounds.

Disciplines
Publication Date
August, 1991
Publisher Statement
Reprinted (adapted) with permission from Journal of the American Chemical Society 113 (1991): 6711, doi:10.1021/ja00018a001. Copyright 1991 American Chemical Society.
Citation Information
David R. Gano, Mark S. Gordon and Jerry A. Boatz. "Ab Initio Study of Some Methylene and Silylene Insertion Reactions" Journal of the American Chemical Society Vol. 113 Iss. 18 (1991)
Available at: http://works.bepress.com/mark_gordon/106/