Numerous studies have investigated the role of photoionization in ultrafast laser-induced damage of bulk dielectrics. This study examines the role of spectral width and instantaneous laser frequency in laser-induced damage using a frequency dependent multiphoton ionization model and numerical simulation of an 800 nm laser pulse propagating through fused silica. When the individual photon wavelengths are greater than 827 nm, an additional photon is required for photoionization, reducing the probability of the event by many orders of magnitude. Simulation results suggest that this frequency dependence may significantly affect the processes of laser-induced damage and filamentation.