James R. Doyle Copyright (c) 2013 All rights reserved. http://works.bepress.com/james_doyle Recent documents in James R. Doyle en-us Thu, 31 Jan 2013 16:55:53 PST 3600 Macro-trench studies of the surface reaction probability in a-Si:H deposition http://works.bepress.com/james_doyle/15 http://works.bepress.com/james_doyle/15 Thu, 16 Feb 2012 20:58:19 PST A. Nurrudin et al. Effect of Near-Substrate Plasma Density in the Reactive Magnetron Sputter Deposition of Hydrogenated Amorphous Germanium http://works.bepress.com/james_doyle/14 http://works.bepress.com/james_doyle/14 Thu, 16 Feb 2012 20:44:58 PST T. Kaufman-Osborne et al. The effects of temperature and near-substrate plasma density on the structural and electrical properties of dc sputtered germanium thin films http://works.bepress.com/james_doyle/13 http://works.bepress.com/james_doyle/13 Thu, 09 Feb 2012 13:58:32 PST Tobin Kaufman-Osborn et al. Effect of anode bias on plasma confinement in dc magnetron discharges http://works.bepress.com/james_doyle/12 http://works.bepress.com/james_doyle/12 Thu, 11 Aug 2011 07:49:12 PDT James Doyle et al. Hydrogen release kinetics during reactive magnetron sputter deposition of a‐Si:H: An isotope labeling study http://works.bepress.com/james_doyle/11 http://works.bepress.com/james_doyle/11 Thu, 11 Aug 2011 07:46:13 PDT J. R. Abelson et al. Surface reaction probability in hydrogenated amorphous silicon growth http://works.bepress.com/james_doyle/10 http://works.bepress.com/james_doyle/10 Thu, 11 Aug 2011 07:44:33 PDT A. Nurrudin et al. Radical and film growth kinetics in methane radio‐frequency glow discharges http://works.bepress.com/james_doyle/9 http://works.bepress.com/james_doyle/9 Thu, 11 Aug 2011 07:41:35 PDT D. J. Dagel et al. Chemical kinetics in low pressure acetylene radio frequency glow discharges http://works.bepress.com/james_doyle/8 http://works.bepress.com/james_doyle/8 Thu, 11 Aug 2011 07:31:52 PDT James Doyle Effects of surface topography on oxide deposition rates using TEOS/O2 chemistry http://works.bepress.com/james_doyle/7 http://works.bepress.com/james_doyle/7 Thu, 11 Aug 2011 07:28:16 PDT James Doyle et al. A comparative study of interatomic potentials for copper and aluminum gas phase sputter atom transport simulations http://works.bepress.com/james_doyle/6 http://works.bepress.com/james_doyle/6 Thu, 11 Aug 2011 07:25:34 PDT Keith Kuwata et al. Effects of substrate temperature and near-substrate plasma density on the properties of dc magnetron sputtered aluminum doped zinc oxide http://works.bepress.com/james_doyle/5 http://works.bepress.com/james_doyle/5 Thu, 11 Aug 2011 07:22:22 PDT Nathan W. Schmidt et al. Physics and chemistry of hot-wire chemical vapor deposition from silane: Measuring and modeling the silicon epitaxy deposition rate http://works.bepress.com/james_doyle/4 http://works.bepress.com/james_doyle/4 Thu, 11 Aug 2011 07:11:51 PDT Ina T. Martin et al. Dynamics of the emplacement of the Heart Mountain allochthon at White Mountain: Constraints from calcite twinning strains, anisotropy of magnetic susceptibility, and thermodynamic calculations http://works.bepress.com/james_doyle/3 http://works.bepress.com/james_doyle/3 Thu, 19 Aug 2010 07:07:29 PDT John P. Craddock et al. Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe : H http://works.bepress.com/james_doyle/2 http://works.bepress.com/james_doyle/2 Wed, 30 Apr 2008 09:49:05 PDT James Doyle et al. The Effect of Oxygen Contamination on the Electronic Properties of Hot-Wire CVD Amorphous Silicon Germanium Alloys http://works.bepress.com/james_doyle/1 http://works.bepress.com/james_doyle/1 Sat, 12 Apr 2008 12:23:32 PDT S. Datta et al.