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Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe : H

James Doyle, Macalester College
Y Xu
R Reedy
H M. Branz
A H. Mahan

Suggested Citation

James Doyle, Y Xu, R Reedy, H M. Branz, and A H. Mahan. "Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe : H" Thin Solid Films 516.5 (2008): 526-528.



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