Doyle is an experimentalist in plasma and materials physics. 

His research interests include thin film materials science and plasma physics and
electrodeposition of semiconductors. 

Doyle has received a National Science Foundation grant to study the effects of energetic
particle bombardment on the sputter growth and properties of conducting zinc oxide thin
films. 

EDUCATION: B.S., University of Michigan Ph.D., University of Colorado 

Doyle has been teaching at Macalester since 1992. 

Articles

OpenURL

Effect of Near-Substrate Plasma Density in the Reactive Magnetron Sputter Deposition of Hydrogenated Amorphous Germanium (with T. Kaufman-Osborne, K.M. Pollock, J. Hiltrop, K. Braam, and S. Fazzio), Thin Solid Films (2012)
 

OpenURL

Properties of Hydrogenated Amorphous Silicon-Germanium Alloys Deposited by Dual Target Reactive Magnetron Sputtering, Materials Research Society Symposium Proceedings (2012)

This article was presented at the Materials Research Society Spring 2012 Meeting, San Francisco. A...

 

OpenURL

The effects of temperature and near-substrate plasma density on the structural and electrical properties of dc sputtered germanium thin films (with Tobin Kaufman-Osborn, Kristin M. Pollock, Jonas Hiltrop, Kyle Braam, and Steven Fazzio), Thin Solid Films (2012)
 

OpenURL

Effects of temperature and near-substrate plasma density on the structural and electrical properties of dc sputtered germanium thin films (with K. M. Pollock, T. Kaufman-Osborn, and J. Hiltrop), Journal of Vacuum Science and Technology A (2011)
 

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Physics and chemistry of hot-wire chemical vapor deposition from silane: Measuring and modeling the silicon epitaxy deposition rate (with Ina T. Martin, Charles W. Teplin, Howard M. Branz, and Paul Stradins), Journal of Applied Physics (2010)