Doyle is an experimentalist in plasma and materials physics. 

His research interests include thin film materials science and plasma physics and
electrodeposition of semiconductors. 

Doyle has received a National Science Foundation grant to study the effects of energetic
particle bombardment on the sputter growth and properties of conducting zinc oxide thin
films. 

EDUCATION: B.S., University of Michigan Ph.D., University of Colorado 

Doyle has been teaching at Macalester since 1992.

Articles

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Effect of Near-Substrate Plasma Density in the Reactive Magnetron Sputter Deposition of Hydrogenated Amorphous Germanium (with T. Kaufman-Osborne, K.M. Pollock, J. Hiltrop, K. Braam, and S. Fazzio), Thin Solid Films (2012)
 

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The effects of temperature and near-substrate plasma density on the structural and electrical properties of dc sputtered germanium thin films (with Tobin Kaufman-Osborn, Kristin M. Pollock, Jonas Hiltrop, Kyle Braam, and Steven Fazzio), Thin Solid Films (2012)
 

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Physics and chemistry of hot-wire chemical vapor deposition from silane: Measuring and modeling the silicon epitaxy deposition rate (with Ina T. Martin, Charles W. Teplin, Howard M. Branz, and Paul Stradins), Journal of Applied Physics (2010)
 

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Dynamics of the emplacement of the Heart Mountain allochthon at White Mountain: Constraints from calcite twinning strains, anisotropy of magnetic susceptibility, and thermodynamic calculations (with John P. Craddock, David H. Malone, Jerry Magloughlin, Avery L. Cook, and Michael E. Rieser), The Geological Society of America Bulletin (2009)
 

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Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe : H (with Y Xu, R Reedy, H M. Branz, and A H. Mahan), Thin Solid Films (2008)
 

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