Doyle is an experimentalist in plasma and materials physics. His research interests include thin film materials science and plasma physics and electrodeposition of semiconductors. Doyle has received a National Science Foundation grant to study the effects of energetic particle bombardment on the sputter growth and properties of conducting zinc oxide thin films. EDUCATION: B.S., University of Michigan Ph.D., University of Colorado Doyle has been teaching at Macalester since 1992.
Effect of Near-Substrate Plasma Density in the Reactive Magnetron Sputter Deposition of Hydrogenated Amorphous Germanium (with T. Kaufman-Osborne, K.M. Pollock, J. Hiltrop, K. Braam, and S. Fazzio), Thin Solid Films (2012)
Properties of Hydrogenated Amorphous Silicon-Germanium Alloys Deposited by Dual Target Reactive Magnetron Sputtering, Materials Research Society Symposium Proceedings (2012)
This article was presented at the Materials Research Society Spring 2012 Meeting, San Francisco. A...