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Article
Cure Depth Control for Complex 3D Microstructure Fabrication in Dynamic Mask Projection Microstereolithography
Rapid Prototyping Journal
  • Jae-Won Choi, University of Akron, main campus
  • Ryan B. Wicker
  • Seok-Hyun Cho
  • Chang-Sik Ha
  • Seok-Hee Lee
Document Type
Article
Publication Date
1-1-2009
Abstract

– The paper's aim is to explore a method using light absorption for improving manufacturing of complex, three‐dimensional (3D) micro‐parts with a previously developed dynamic mask projection microstereolithography (MSL) system. A common issue with stereolithography systems and especially important in MSL is uncontrolled penetration of the ultraviolet light source into the photocrosslinkable resin when fabricating down‐facing surfaces. To accurately fabricate complex 3D parts with down‐facing surfaces, a chemical light absorber, Tinuvin 327™ was mixed in different concentrations into an acrylate‐based photocurable resin, and the solutions were tested for cure depths and successful micro‐part fabrication.

Citation Information
Jae-Won Choi, Ryan B. Wicker, Seok-Hyun Cho, Chang-Sik Ha, et al.. "Cure Depth Control for Complex 3D Microstructure Fabrication in Dynamic Mask Projection Microstereolithography" Rapid Prototyping Journal Vol. 15 Iss. 1 (2009) p. 59 - 70
Available at: http://works.bepress.com/jae-won_choi/32/