Articles «Previous Next»

Edge-on face-to-face MOSFET for synchrotron microbeam dosimetry: MC modeling

A. Rosenfeld, University of Wollongong
E. A. Siegbahn, European Synchrotron Radiation Facility, France
E. Brauer-Krisch, European Synchrotron Radiation Facility, France
A. Holmes-Siedle, REM Oxford Ltd, UK
M. L. Lerch, University of Wollongong
A. Bravin, European Synchrotron Radiation Facility, France
I. Cornelius, University of Wollongong
G. J. Takacs, University of Wollongong
N. Painuly, University of Wollongong
H. Nettleback, University of Wollongong
T. Kron, Peter MacCallum Cancer Institute, Melbourne

Article comments

This paper originally appeared as: Rosenfeld, AB, Siegbahn, EA, Bruaer-Krish, E et al, Edge-on face-to-face MOSFET for synchrotron microbeam dosimetry: MC modeling, IEEE Transactions on Nuclear Science, December 2005, 52(6)1, 2562-2569. Copyright IEEE 2005.

Abstract

The dosimetry of X-ray microbeams using MOSFETs results in an asymmetrical beam profile due to a lack of lateral charged particle equilibrium. Monte Carlo simulations were carried out using PENELOPE and GEANT4 codes to study this effect and a MOSFET on a micropositioner was scanned in the microbeam. Based on the simulations a new method of microbeam dosimetry is proposed. The proposed edge-on face-to-face (EOFF) MOSFET detector, a die arrangement proposed here for the first time, should alleviate the asymmetry. Further improvement is possible by thinning the silicon body of the MOSFET.

Suggested Citation

A. Rosenfeld, E. A. Siegbahn, E. Brauer-Krisch, A. Holmes-Siedle, M. L. Lerch, A. Bravin, I. Cornelius, G. J. Takacs, N. Painuly, H. Nettleback, and T. Kron. "Edge-on face-to-face MOSFET for synchrotron microbeam dosimetry: MC modeling" Faculty of Engineering - Papers (2005).
Available at: http://works.bepress.com/gtakacs/6



Share