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Article
Adsorption-Controlled Growth of BiVO4 by Molecular-Beam Epitaxy
APL Materials
  • D. A. Hillsberry, Boise State University
  • D. A. Tenne, Boise State University
Document Type
Article
Publication Date
10-1-2013
DOI
http://dx.doi.org/10.1063/1.4824041
Disciplines
Abstract

Single-phase epitaxial films of the monoclinic polymorph of BiVO4 were synthesized by reactive molecular-beam epitaxy under adsorption-controlled conditions. The BiVO4 films were grown on (001) yttria-stabilized cubic zirconia (YSZ) substrates. Four-circle x-ray diffraction, scanning transmission electron microscopy (STEM), and Raman spectroscopy confirm the epitaxial growth of monoclinic BiVO4 with an atomically abrupt interface and orientation relationship (001)BiVO4 ∥ (001)YSZ with [100]BiVO4 ∥ [100]YSZ. Spectroscopic ellipsometry, STEM electron energy loss spectroscopy (STEM-EELS), and x-ray absorption spectroscopy indicate that the films have a direct band gap of 2.5 ± 0.1 eV.

Copyright Statement

This document was originally published by AIP Publishing, LLC. in APL Materials. This work is provided under a Creative Commons Attribution License. Details regarding the use of this work can be found at: http://creativecommons.org/licenses/by/3.0/. Doi:10.1063/1.4824041.

Citation Information
D. A. Hillsberry and D. A. Tenne. "Adsorption-Controlled Growth of BiVO4 by Molecular-Beam Epitaxy" APL Materials (2013)
Available at: http://works.bepress.com/dmitri_tenne/51/