Article
Influence of reactive atmosphere on properties of cobalt ferrite thin films prepared using pulsed-laser deposition
Journal of Applied Physics
(2011)
Abstract
A series of cobaltferrite (CFO) thin films were grown on SiO2/Si(100) substrates using pulsed-laser deposition (PLD) at substrate temperature (T DEP) of 250 °C and oxygen pressures (P O2) from 0.67 to 6.7 Pa. The influence of PO2 on crystal structure, phase mixture, deposition rate, and magnetic properties was investigated. It is shown in this study that there is a window of PO2 for optimized growth of nanograined CFO films at low T DEP and that either higher or lower values of PO2 produce undesirable multiphase mixtures. CFO filmsgrown at such low substrate temperature and optimized oxygen pressure on thermal expansion matched substrates can be applied in multilayer sensors or MEMS devices.
Keywords
- Thin film growth,
- Thin films,
- Ferrites,
- Thin film deposition,
- Magnetic films
Disciplines
Publication Date
2011
Publisher Statement
Copyright 2011 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
The following article appeared in Journal of Applied Physics 109 (2011): 083922 and may be found at http://dx.doi.org/10.1063/1.3574918.
Citation Information
A. Raghunathan, David C. Jiles and J. E. Snyder. "Influence of reactive atmosphere on properties of cobalt ferrite thin films prepared using pulsed-laser deposition" Journal of Applied Physics Vol. 109 Iss. 8 (2011) Available at: http://works.bepress.com/david_jiles/54/