Single crystal Fe films grown on Ge(001) substrates by magnetron sputtering
Originally published in Applied Physics Letters 89, 112501 (2006). DOI:10.1063/1.2339041 (http://dx.doi.org/10.1063/1.2339041).
Single crystal Fe films were grown on Ge (001) substrates by using dc magnetron sputtering. It was found that the microstructures and magnetic properties of Fe films on Ge substrates were strongly dependent upon the substrate temperature during the deposition process. There existed a narrow substrate temperature window of 125 ± 25°C for achieving single crystal Fe film on Ge. Lower substrate temperature led to polycrystalline Fe films due to limited mobility of Fe atoms, while higher substrate temperatures resulted in amorphous Fe-Ge alloy due to severe interdiffusion.
J. Lou, A. Daigle, L. Chen, Y. Q. Wu, V. G. Harris, C. Vittoria, and N. X. Sun. "Single crystal Fe films grown on Ge(001) substrates by magnetron sputtering" Electrical and Computer Engineering Faculty Publications (2006).
Available at: http://works.bepress.com/cvittoria/106